Carbon coatings with high concentrations of silicon deposited by RF PECVD method at relatively high self-bias

1. Jedrzejczak, A.
2. Batory, D.
3. Dominik, M.
4. Smietana, M.
5. Cichomski, M.
6. Szymanski, W.
7. Bystrzycka, E.
8. Prowizor, M.
9. Kozlowski, W.
10. Dudek, M.