Effect of processing parameters on the deposition rate of Si 3N4/Si2N2O by chemical vapor infiltration and the in situ thermal decomposition of Na2SiF 6

  1. Pech-Canul, M.I.
  2. De La Peña, J.L.
  3. Leal-Cruz, A.L.
Journal:
Applied Physics A: Materials Science and Processing

ISSN: 0947-8396,  1432-0630

Year of publication: 2007

Volume: 89

Issue: 3

Pages: 729-735

Type: Article

DOI: 10.1007/S00339-007-4153-Z GOOGLE SCHOLAR
Data source: Scopus